Nov 18, 2012
ECE Project on P-N Diode Diffusion
This is a final year major electronics project on PN diode diffusion. Today there are so many reasons for using a diffusion technique in the process of fabrication of a p-n diode. This is because the diodes are the most commonly used semiconductor devices in almost all types of the electronic circuits. A diode plays a very important role in a circuit due to its property to conduct only in forward direction. It does not allow any current to pass through it when it is in reverse bias mode. You can also Subscribe to FINAL YEAR PROJECT'S by Email for more such projects and seminar.
Chemical cleaning is one of the most important part of the diffusion process. It is necessary in the beginning of the process because it provides a fresh silicon wafer for diffusion. Initially when wafer is cut from a big size wafer or from a large wafer then it is essential that is must be cleaned properly. This is done in order to remove all the unwanted impurities that may cause problem during the diffusion process of the p-n junction diode.
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